Mask/Reticle/photo mask inspection sysytem


Overview

TSL-SP7-LS Series:
  • Apply for 2um above pattern inspection,Min. defect size:0.75um
  • Photomask platform dimension:800*700mm,Customization:Max.850*960mm
  • Provide 2 models: SP7-LS3 / SP7-LS2,Flexible adjustment
  • Inspection mode:DRC(Design Rule Check)&Data reference mode can run at the same time,Ensure product defects are discovered within appropriate parameters



Mask placement fixture,flexible adjustment
HEPA air filtration system can be retrofitted
The screen distance can be adjusted for more flexible operation




TSL-SP7-LS Series外觀預覽