Pellicle+Mask Inspection System


Special Function

min defect: 0.5um

Equipped with high resolution inspection ability.Install unique light source for Pellicle inspection sytem.Can inspect min. 0.5um defect/scratch.

Inspection graphic without restrictions

The system can inspect various types of graphics, whether simple or complex, and can provide comprehensive inspection capabilities to ensure the accuracy and completeness of detection.

Auto feeding/discharging system

The automated feeding/discharging system effectively reduces personnel's direct contact with the photomask, reduces the risk of contamination and damage, and improves operating efficiency and product quality.

Each layer can be inspected

Each layer(photomask/pellicle) needs to be inspected separately. To ensure each layer can meet the standard.

HEPA air filtration system

Equipped with a high-efficiency particulate air filter (HEPA), which can filter out 99.97% of tiny particles, providing a clean operating environment, further reducing the risk of contamination and ensuring product stability.

Pellicle defect unique light source

The light source specially designed for Pellicle defect detection provides stable and high-brightness lighting to ensure the accuracy and reliability of detection results.

Min. floor space

The integrated design of the main machine + box opening system + automatic feeding and discharging system of this product covers an overall area of only 1350 x 2150 x 1800 mm. This design saves space in the factory and allows it to be deployed more flexibly in different production environments.




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