Pellicle + Mask Inspection System


Overview

Why need Pellicle+Mask Inspection System

Mainly because photomask (Pellicles) play a key role in semiconductor manufacturing and other optical applications,
Its quality directly affects the performance and reliability of the final product


Each layer can be inspected

Each layer(photomask/pellicle) needs to be inspected separately
As shown on the left,both ABCD and layered can be inspected. Find tiny dust.





Pellicle 檢測面示意圖
Pellicle 檢查機外觀預覽