| Model | TSL-PEL-DRC | TSL-PEL-REF |
|---|---|---|
| Product brief | Inspect particle/scratch in each layer | Used to inspect dust/scratches on each layer Can inspect pattern damage, pinholes, etc. on the photomask |
| inspection object | Pellicle + Mask | |
| platform | 12" photomask box | |
| inspection area | 300mm X 300mm(customize) | |
| inspection speed | < 15min (Single layer) | |
| inspection mode | DRC | DRC+REF |
| scan area | pellicle top -A pellicle backside -B Pattern top -D Photomask backside -C |
|
| defect type | Stains/flock/scratches/dust/damage/fingerprints | |
| Data reference mode | ||
| Data reference mode-defect type | Open/Short, pinhole, dust, scratch 、PAD shift, wrong pattern size,etc… |
|
| Mask pattern inspection capabilities | Min. line/space width: 2um↑ Min. defect size: 0.75um |
|
| Data reference-work station | ||
| supported data | RS274X、ODB++、GDSII、DXF | |
| DRC Fuction | ||
| auto feeding/discharging system | ||
| Min. particle size | 0.5um | |
| HEPA protection | ||
| Auto focus | ||
| Redundant system | ||
| Storage device specifications | ||
| Dimension | W1530 X D2150 X H 1800 | |
